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May I ask in what state or form are the elements used during Ion Implantation process? for example if I were to use Molybdenum as an implanter.

Just awesome !!!!

thank you

Can you confirm the difference between an order that does matter and one that doesn't by using the same example for both situations? Shouldn't I have a higher number for when Order Doesn't Matter than when it does? Also, why does your formula for Order Doesn't Matter with Replacement, n^k/k!, look different from all the others I'm seeing online, (n+k-1)!/k!(n-1)!?

No mention.of "dielectric isolation" using anisotropic etching of V grooves, followed by 600 microns of Polly. Flip the wafer over and grind/polish back to achieve isolation.

Amazing material! Thanks for sharing them. And is crazy how you can be right on so many things, but people will comment on the one you are wrong!

I will learn it after my invention will become public for all the world. By the way my profession is a dentist and I am not related to AI, Quantum, Encryption.

This music video is quite humorous, a little self-deprecating, but it accurately describes the life situations that middle-aged people may face ... But there is no negativity, decadence and can still be optimistic about the future of life

My algorithm can help make the lithography masks without defects for producing chips. Thank you for your explanation, I learned new things today.

Wonderful video, thank you! Incredibly helpful

You're the G.O.A.T. prof, thank you for your lectures!

I like this video b/c you explain every single detail with their purposes. Really appreciate! Already subscribed.

Very helpful thank you so much.

Now Chinese can listen into this info and build their own machines ..... 😊 Ah .... this video is 10 yrs ago

Dear Chris, Thanks! how can I do "proximity effect correction" for my structure (using Raith 150 Two Ebeam lithography tool)? should I consider lower dose factors for the features in the middle of my 2D grating as they get more proximity effect?

Hi Chris, thanks for the nice presentation. What does "Throughput" mean in E-Beam lithography? Does it mean the speed of the system in completing the pattern?

Great teaching!

thank you sir, for your efforts and information..

great lectures! make complex concept straightforward

neither of the Excel formulae you show for xC has the -2

The Excel formulae you show for AIC and BIC don't have the factor of -2. Since you DO have a 2 in the penalty term for AIC, I don't see how this can be right, and certainly not for BIC.

I've pasted links to your videos for our engineers to use. They are absolutely phenomenal.

*ELI5 Abstract* *Imagine you have a special computer program that helps you build tiny* *things on computer chips.* We made this program even better! Now it works faster, makes fewer mistakes, and is super easy to use. *We also made a new tool that works with the program.* This tool is like a magic helper. You show it what you made on a real chip, and it tells the computer program how to change its settings to make the computer chip picture match the real one. No more guessing! *Abstract* K-tenor announces significant upgrades to its lithography simulation software Prolith. The new version 7 boasts enhanced speed, accuracy, and ease of use in simulating cutting-edge lithographic processes. Additionally, K-tenor introduces Autotune, a new module within Pro Data. Autotune streamlines simulation parameter optimization by automatically aligning Prolith's output with experimental data. This innovation removes guesswork from simulations, making Prolith an even more powerful tool for lithography research and development. i used gemini to summarize the transcript

*ELI5 Abstract* *Imagine you're building with tiny blocks:* * We made our building block software (it's called Prolith) better! Now it can show you how your block towers will look even more like the real thing. It's faster and easier to use. * We also made a special helper robot called Autotune. This robot watches how you build with blocks and then helps the building block software make super accurate pictures of what you might build. * No more guessing if your block tower will turn out right! Our software and robot helper make it easier to know what things will look like before you even start building. *Abstract* Prolith version 7.2 introduces a groundbreaking optional module called "Etch Simulation for Lithographers." This software innovation empowers lithographers to comprehend how the lithographic process influences the final (after-etch) critical dimension (CD). The module simulates the etching process comprehensively, factoring in multiple stages, arcs, and even the potential for resist variation between layers. Users can analyze how lithographic adjustments (e.g., alterations in focus or dose) affect the resultant CD or etch profile. Coupled with auto-tuning capabilities, this simulation tool streamlines lithographic optimization by explicitly considering etching. Consequently, it leads to advancements in OPC characterization and enhances overall simulation accuracy. For additional details on Prolith version 7.2 with Etch Simulation for Lithographers, please visit the K-Tencor webpage. i used gemini to summarize the transcript

20 year, the patent has expired, i wanna play with that software!

Amazing Chris !

Where has ni value come from? 1.5 one in the first example?

Is it possible to limit the step coverage by utilizing a collimator/grating in front of the wafer?

Great lecture on basic understanding.

Tnx.

you're the og ily

I currently work at Intel as a Process Engineer and your lectures are truly amazing! I benefited a lot from them especially the EPD Etch Lecture and the Nano-imprint lithography!

Amazing journey! Thanks for sharing this!

Hey Chris great video. Curious why you skipped your SEMATECH assignment when listing your career highlights. Perhaps I just figured it out. Thanks for your insights and contributions to the industry.

Thanks for the advice and thanks a lot for the best lectures)

Thanks a lot for the inspiring advice.

One of the best videos about career advice

Your lectures are hugely underrated. Specifically, your statistics review lecture is just wow! I currently work at KLA. Greatly benefited from your lectures. Thanks a lot for spreading your knowledge :) I see KLA has some great people like you [you may know Eugene :)], I am happy that you were also here at some point. Wishing you all the best.

Very encouraging, Dr. Mack. Thank you for the video.

Nice talk! great! When I was an lithography process engineer at 1997, I found there seems no clear knowledge information for me to handle this job smartly, but just try error! This job combines diverse knowledge to print pattern from mask to wafer! Your Prolith simulator help me a lot to clarify some at that time! Your advisor “ Not just follow your passion…” is wisdom word to the worker in industry to review his job career! BTW, sometime later, you might find to try Levy walk rather than random walk can see different view in nanometer scale patterning world!

Absolutely wonderful video Dr. Mack.

Your lectures on semiconductor lithography processes have been resourceful and helped me secured my job. I make reference to them even today. I appreciate your contributions, salute your dedication and want to thank you for making yourself accessible and your lecture materials available.

Really appreciate your great contribution to lithography and IC industry! Your tutorials are the best teaching material I ever read.🫡

Love your videos!! Thank you so much for sharing. I am a hardware chemical engineer at IBM with no background in lithography. Your videos and textbook helped me immensely. I'll def say hi if I see you at a conference. Thank you Chris

Great talk. I always loved your videos lessons, which I found at random when preparing for a technical interview in the Semiconductor industry about 10 years ago. I had immigrated to the US because of a girl, which didn't work either, my background was in Law and Goverment...so the skills did not transfer across borders. I was working at a microchip fab, as an operator because that's where the girl worked. We had a kid on the way and I knew I needed to make more money. The company had a few openings for technicians in the Photo and the Metrology department. I liked hardware and computers, I had an advance degree in my country...that proved I could be trained, or at least that's what I said in the initial interview to wheasel my way into the technical interview. I never attended your lessons in person nor the University of Texas for that matter, but I did get Cambell's book and tried to follow the best I could. One of the best classes I ever "took". I went back to school and got a few hard science related degrees from US accredited schools while working full time. 10 years later, I still work in the industry, helping with research and development. it has been a very random journey...but a good one at that. Destiny is not real, but we are all slaves to causality. Thank you for the indirect and non intended help and mentorship.

*Summary* *Introduction and Career Overview* - 0:00: Introduction by Chris Mack, reflecting on his 40-year career in the semiconductor industry as 2023 ends. - 0:35: Shows progression through his career via headshots, with the last one from 2011. - 1:01: Discusses the traditional linear narrative of career bios but contrasts it with his own career's 'random walk'. *Early Career and Education* - 2:01: Begins with addressing common career advice like "Follow Your Passion", questioning its applicability to a non-linear career path. - 3:01: Talks about his education at Rose-Hulman Institute of Technology, studying physics and chemistry without a clear plan. - 4:12: Mentions a seven-year gap between degrees, leading to a story about dropping out of Caltech and a relationship that didn't work out. *Professional Journey and Shifts* - 5:21: First job at the National Security Agency (NSA) due to an existing top secret clearance, with a focus on lithography starting accidentally. - 7:49: Describes how reading the Dill papers at IBM inspired his career focus in lithography. - 8:31: Develops his lithography simulator, PROLITH, while at NSA and decides to distribute it for free. - 9:33: Leaves NSA in 1989 to start his own company, Finle Technologies, focused on commercializing his lithography software. - 10:14: Earns his PhD in Chemical Engineering from the University of Texas during his time running Finle Technologies. - 11:59: Sells Finle Technologies to KLA-Tencor in 2000 and shifts focus to data, working there until 2005. *Teaching, Writing, and RUclips Channel* - 12:50: Quits KLA-Tencor in 2005 after the birth of his first child, focusing on his website lithoguru.com and writing, including his textbook "Fundamental Principles of Optical Lithography". - 14:00: Discusses the challenge of writing his textbook on lithography, with technology evolving faster than he could write. - 14:21: Highlights the completion of his textbook as a career milestone. - 14:23: Mentions his other book, "How to Write a Good Scientific Paper," born from his experience as editor-in-chief of a peer-review journal, available for free. - 14:48: Talks about fulfilling his teaching aspirations by teaching part-time at the University of Texas for over 25 years, including guest stints at the University of Notre Dame and University of Canterbury in New Zealand. - 15:24: Describes his adoption of the flipped classroom model for his courses in chemical processes for micro and nanofabrication, and data analysis. - 16:04: Used RUclips to deliver lectures for flipped classrooms, unexpectedly growing his channel to 23,000 subscribers. *Focus on Stochastics and Metrology* - 17:12: Explores his fascination with stochastics, a significant topic in lithography and semiconductor patterning. - 19:13: Describes the challenge of controlling stochastic variations in semiconductor manufacturing, now a dominant source of variation in patterning. - 21:03: Discusses the scaling of stochastic variability and its increasing impact as feature sizes shrink. - 22:01: Talks about the need for new measurement approaches to address stochastics and his invention of a new method to reduce noise in scanning electron microscope images. - 23:46: Founded Fractia, a computational metrology company, combining his expertise in modeling, data, and stochastics. - 24:14: Defines his current role as a metrologist, focusing on the science of measurement. *Reflections and Career Philosophy* - 24:34: Reflects on his career path, emphasizing that it was not planned but a series of prepared responses to random events. - 25:01: Quotes Eisenhower on the importance of planning and Louis Pasteur on chance favoring the prepared mind, relating them to his career philosophy. - 25:37: Advises not just to follow a single passion but to find passion in whatever path one is on, suggesting adaptability and commitment are key. Disclaimer: I used chatgpt4 to summarize the transcript.

Under the radar, and I have seen many different lectures and videos. With yours I was able to really grasp it, great teaching style!

Could you please explain the reasons that justify after positive autocorrelation, the MSE estimate of the residual variance will underestimate the true variance ? or do you mean that it is a good outcome as the coefficient will be more accurate ?

Thank you Chris, I think this is one of the best series and best explanations I faced, its amazing how simple you can explain this advanced concepts. Thank you very much!

I am probably wrong, but for Chauvnet's criterion P-value*n isn't the probability to obtain 1 point at least that unsual. To compute this probability i believe one should define a Bernoulli process with p=pvalue and consider n experiments. Then the probability to obtain exactly one outlier would be (1 choose n)*(1-p)^(N-1)*p = n(1-p)^(N-1)*p. Several observation that seem to be on my side of things : 1) as n-> inf P-value*n -> inf which doesn't make sens if it is suppose to be a probability, 2) point 1) isn't an issue if one realises that n*P-value=n*p is in fact the expectation of such a Bernoulli process for n experiments. This claims are also in accordance with this wikipedia article (in french i am sorry) : fr.wikipedia.org/wiki/Test_de_Chauvenet